Vibrantz is a leading global manufacturer of optimized high-purity slurries with excellent stability designed for polishing aluminum alloy and stainless steel. We offer a wide range of alumina-based slurries for polishing aluminum alloy and stainless steel. Our slurries provide a better polishing capability resulting in a mirror-like surface with good surface flatness. Ideal for mechanical polishing, our slurries have good surface roughness that deliver low defectivity.

We also work with our customers to design custom polishing products with tailored properties required for our customers’ increasingly complex polishing and process requirements.

Our alumina abrasives deliver excellent polishing performance for automotive clear coat surface finishing. We offer a wide range of custom aluminum oxide powders and aqueous based alumina slurries used for both aftermarket and OEM automotive clear coat polishing. Ferro’s aluminum oxide clear coat polishing abrasives are manufactured to stringent requirements, assuring the best possible outcome and consistent product performance from batch to batch.

We are a leading global manufacturer of high-purity, alumina-based plastic lens polishing compounds that deliver the excellent polishing performance and high-quality finished surfaces required for optical lens surfacing. We manufacture a diverse portfolio of high-purity alumina slurry products and powders available with varying characteristics, allowing our customers to select the best option for polishing resin-based prescription lenses.

Aspire™ is our premium alumina polishing slurry product formulated to be used with digital/freeform and conventional prescription lens polishing processes.  It can be used to polish all resin-based ophthalmic lens substrates.

Vibrantz is a leading global manufacturer of high-performance cerium oxide and rare-earth oxide materials designed to deliver excellent polishing performance for many various glass polishing applications including precision optic lenses, flat glass/mirror, LCD, and blue filter glass. We offer a wide range of customized, application-based cerium oxide glass polishing product formulations with a tightly controlled particle size distribution and excellent suspension characteristics to ensure a consistent polishing performance from batch to batch.

Cerium oxide-based glass polishing products are available mainly as dry powders, however they can be provided in slurry form as well.

CeRite^® is our series of high-performance cerium oxide-based polishing powder and slurries formulated for glass polishing applications.

We offer a range of shallow trench isolation (STI) CMP solid state cerium oxide slurries designed to deliver low scratch performance from the 65nm node to 14nm and below. With over 40 years of ceria particle engineering experience, we’ve been able to develop a highly dispersed ceria particle that meets the stringent defectivity requirements of advanced technology requirements.

Our high-performance specially formulated STI CMP colloidal ceria products are designed for low point of use solids.

Our optimized high-purity slurries designed to deliver optimal performance in bare silicon wafer CMP applications. We offer a wide range of CMP slurries that are designed for the primary and secondary polishing of bare silicon wafers. Our CMP slurries achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

We also work with our customers to design custom polishing products with tailored properties required for our customers’ increasingly complex CMP process requirements.

We offer optimized high-purity slurries with excellent stability designed for CMP polishing wafers for reclaim processing. Our wide range of alumina-based CMP slurries for polishing reclaims wafers provide a better polishing capability for complex hard films with high throughput. Ideal for mechanical polishing, our slurries have a good surface roughness that delivers low defectivity.

Our CMP slurries achieve optimal metal CMP removal rates and have excellent shelf life, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

Our optimized high-purity slurries are designed to deliver optimal performance in metal CMP applications.

We offer a wide range of aqueous slurries for silicon carbide substrates that are developed to achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity utilizing existing equipment and space.

Vibrantz is a leading global manufacturer of optimized high-purity copper barrier slurries designed to deliver optimal performance in metal CMP applications. Our line of copper barrier CMP slurries provides a wide range of aqueous copper barrier slurries designed to remove the barrier metals that are exposed following copper clearing. Our copper barrier CMP slurries achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

SN4501 copper barrier CMP slurries feature a tunable removal rate for copper barrier and oxide with linear response to downforce.

Selectivity is also tunable for copper/TEOS which allows a good oxide loss control and results in low surface roughness.

We offer optimized high-purity copper CMP slurries designed to deliver optimal performance in metal CMP applications. The Vibrantz copper CMP slurry product line offers a wide range of aqueous slurries that achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

Our optimized high-purity CMP cleaners are designed to deliver optimal performance in post copper cleans for metal CMP applications. The GC14200 series is a line of advanced cleaners for post copper CMP processes that combines excellent cleaning performance with maximum copper surface protection.

Vibrantz manufactures a diverse portfolio of high purity silica-based aqueous slurries and suspensions designed for polishing sapphire substrates used in LEDs, camera lens covers, and fingerprint sensor covers. Our offering of silica-based polishing compounds are used for sapphire substrates. Our SN7010 silica slurry products are fully formulated to deliver excellent polishing results for sapphire substrates.

We are a leading global manufacturer of TruPlane^® optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP applications. We offer a wide range of cerium oxide aqueous slurries that achieve optimal dielectric CMP oxide removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space. A tightly controlled particle distribution and large particle counts (LPCs) ensures low-defectivity polishing.

TruPlane^® 1631 is a fast oxide slurry used in applications such as 3D NAND and MEMS where large amounts of oxide removal are required. It is comprised of an engineered ceria particle and a novel accelerant optimized to give high removals for superior defectivity.

We offer optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP applications. We offer a wide range of cerium oxide aqueous slurries that achieve optimal dielectric CMP oxide removal rates resulting in decreased cost of ownership and increased productivity using existing equipment and space.

TruPlane 1731 is a fast oxide slurry used in applications such as 3D NAND and MEMS where large amounts of oxide removal are required. It is the next generation product following our Truplane^® 1631 slurry product line.

Comprised of an engineered ceria particle and a novel accelerant, TruPlane 1731 is optimized to give high removals for superior defectivity. It can also be diluted depending upon process requirements.

We are a leading global manufacturer of optimized high-purity tungsten CMP slurries designed to deliver optimal performance in metal CMP applications. The tungsten CMP slurry product line offers a wide range of aqueous tungsten slurries that achieve optimal metal CMP removal rates, resulting in decreased cost of ownership with increased productivity using existing equipment and space.

Our high-performance zirconium oxide glass polishing products designed to deliver excellent performance for relatively soft ophthalmic and precision optic substrates including digital camera lenses and blue filter glass.

We offer zirconia polishing products available as dry powders and aqueous slurries with excellent suspension characteristics to ensure a consistent polishing performance from batch to batch.

Our zirconium oxide-based glass polishing powders and slurry formulations are developed with application-based tailored properties with tightly controlled particle size distribution to ensure a consistent high-quality surface finish with easy cleaning of polish particles.

Zox® is Vibrantz’s range of zirconium oxide slurries formulated for precision glass polishing of optical lenses, digital camera lenses, phosphate glass and ophthalmic lens polishing.