Product Elements

Vibrantz manufactures a diverse portfolio of high purity silica-based aqueous slurries and suspensions designed for polishing sapphire substrates used in LEDs, camera lens covers, and fingerprint sensor covers. Our offering of silica-based polishing compounds are used for sapphire substrates. Our SN7010 silica slurry products are fully formulated to deliver excellent polishing results for sapphire substrates.

Our optimized high-purity CMP cleaners are designed to deliver optimal performance in post copper cleans for metal CMP applications. The GC14200 series is a line of advanced cleaners for post copper CMP processes that combines excellent cleaning performance with maximum copper surface protection.

We offer optimized high-purity copper CMP slurries designed to deliver optimal performance in metal CMP applications. The Vibrantz copper CMP slurry product line offers a wide range of aqueous slurries that achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

Vibrantz is a leading global manufacturer of optimized high-purity copper barrier slurries designed to deliver optimal performance in metal CMP applications. Our line of copper barrier CMP slurries provides a wide range of aqueous copper barrier slurries designed to remove the barrier metals that are exposed following copper clearing. Our copper barrier CMP slurries achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space.

SN4501 copper barrier CMP slurries feature a tunable removal rate for copper barrier and oxide with linear response to downforce.

Selectivity is also tunable for copper/TEOS which allows a good oxide loss control and results in low surface roughness.

We offer a range of shallow trench isolation (STI) CMP solid state cerium oxide slurries designed to deliver low scratch performance from the 65nm node to 14nm and below. With over 40 years of ceria particle engineering experience, we’ve been able to develop a highly dispersed ceria particle that meets the stringent defectivity requirements of advanced technology requirements.

Our high-performance specially formulated STI CMP colloidal ceria products are designed for low point of use solids.

Vibrantz is a leading global manufacturer of high-performance cerium oxide and rare-earth oxide materials designed to deliver excellent polishing performance for many various glass polishing applications including precision optic lenses, flat glass/mirror, LCD, and blue filter glass. We offer a wide range of customized, application-based cerium oxide glass polishing product formulations with a tightly controlled particle size distribution and excellent suspension characteristics to ensure a consistent polishing performance from batch to batch.

Cerium oxide-based glass polishing products are available mainly as dry powders, however they can be provided in slurry form as well.

CeRite^® is our series of high-performance cerium oxide-based polishing powder and slurries formulated for glass polishing applications.

Our optimized high-purity slurries are designed to deliver optimal performance in metal CMP applications.

We offer a wide range of aqueous slurries for silicon carbide substrates that are developed to achieve optimal metal CMP removal rates, resulting in decreased cost of ownership and increased productivity utilizing existing equipment and space.

We offer optimized high-purity slurries with excellent stability designed for CMP polishing wafers for reclaim processing. Our wide range of alumina-based CMP slurries for polishing reclaims wafers provide a better polishing capability for complex hard films with high throughput. Ideal for mechanical polishing, our slurries have a good surface roughness that delivers low defectivity.

Our CMP slurries achieve optimal metal CMP removal rates and have excellent shelf life, resulting in decreased cost of ownership and increased productivity using existing equipment and space.