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Our loss circulation and squeeze products meet the ever-growing need for wellbore strengthening and more advanced drilling solutions. We offer a variety of engineered products and custom solutions formulated for synthetic or oil- and water-based muds, as well as squeeze products.

Our high specific gravity weighting agents meet varying density requirements and can be used alone in high pressure situations or in combination with barite to reduce the total solids content. We supply both low and ultra-low abrasive weighting agents for customers to reduce equipment wear and tear.

Our suite of mixed metal oxides (MMOs) can be added to a clay containing water-based fluid to enhance its rheological properties. This combination produces a unique thixotropic, shear-thinning fluid that is highly viscous at low shear rates but becomes very thin at high shear rates. These products retain well-bore integrity, especially in high salt-containing and unconsolidated formations, reduce mud loss and prevent loss circulation in highly porous or fractured formations.

Our high-performance zirconium oxide glass polishing products designed to deliver excellent performance for relatively soft ophthalmic and precision optic substrates including digital camera lenses and blue filter glass.

We offer zirconia polishing products available as dry powders and aqueous slurries with excellent suspension characteristics to ensure a consistent polishing performance from batch to batch.

Our zirconium oxide-based glass polishing powders and slurry formulations are developed with application-based tailored properties with tightly controlled particle size distribution to ensure a consistent high-quality surface finish with easy cleaning of polish particles.

Zox® is Vibrantz’s range of zirconium oxide slurries formulated for precision glass polishing of optical lenses, digital camera lenses, phosphate glass and ophthalmic lens polishing.

We are a leading global manufacturer of optimized high-purity tungsten CMP slurries designed to deliver optimal performance in metal CMP applications. The tungsten CMP slurry product line offers a wide range of aqueous tungsten slurries that achieve optimal metal CMP removal rates, resulting in decreased cost of ownership with increased productivity using existing equipment and space.

We offer optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP applications. We offer a wide range of cerium oxide aqueous slurries that achieve optimal dielectric CMP oxide removal rates resulting in decreased cost of ownership and increased productivity using existing equipment and space.

TruPlane 1731 is a fast oxide slurry used in applications such as 3D NAND and MEMS where large amounts of oxide removal are required. It is the next generation product following our Truplane^® 1631 slurry product line.

Comprised of an engineered ceria particle and a novel accelerant, TruPlane 1731 is optimized to give high removals for superior defectivity. It can also be diluted depending upon process requirements.

We are a leading global manufacturer of TruPlane^® optimized high-purity cerium oxide-based polishing slurries designed to deliver optimal bulk oxide removal in dielectric CMP applications. We offer a wide range of cerium oxide aqueous slurries that achieve optimal dielectric CMP oxide removal rates, resulting in decreased cost of ownership and increased productivity using existing equipment and space. A tightly controlled particle distribution and large particle counts (LPCs) ensures low-defectivity polishing.

TruPlane^® 1631 is a fast oxide slurry used in applications such as 3D NAND and MEMS where large amounts of oxide removal are required. It is comprised of an engineered ceria particle and a novel accelerant optimized to give high removals for superior defectivity.

Vibrantz manufactures a diverse portfolio of high purity silica-based aqueous slurries and suspensions designed for polishing sapphire substrates used in LEDs, camera lens covers, and fingerprint sensor covers. Our offering of silica-based polishing compounds are used for sapphire substrates. Our SN7010 silica slurry products are fully formulated to deliver excellent polishing results for sapphire substrates.