We offer a range of shallow trench isolation (STI) CMP solid state cerium oxide slurries designed to deliver low scratch performance from the 65nm node to 14nm and below. With over 40 years of ceria particle engineering experience, we’ve been able to develop a highly dispersed ceria particle that meets the stringent defectivity requirements of advanced technology requirements.

Our high-performance specially formulated STI CMP colloidal ceria products are designed for low point of use solids.